Bryan Cord nanofabricated this pattern that illustrates the exquisite resolution possible using electron-beam lithography. The principles required to perform this fabrication are described and explained in this course. (Image courtesy of Bryan Cord of the MIT Quantum Nanostructures and Nanofabrication Group.)
Instructor(s)
Prof. George Barbastathis
Prof. Henry Smith
Prof. Karl Berggren
MIT Course Number
6.781J / 2.391J
As Taught In
Spring 2006
Level
Graduate
Course Description
Course Features
Course Description
This course surveys techniques to fabricate and analyze submicron and nanometer structures, with applications. Optical and electron microscopy is reviewed. Additional topics that are covered include: surface characterization, preparation, and measurement techniques, resist technology, optical projection, interferometric, X-ray, ion, and electron lithography; Aqueous, ion, and plasma etching techniques; lift-off and electroplating; and ion implantation. Applications in microelectronics, microphotonics, information storage, and nanotechnology will also be explored.
Acknowledgements
The Instructors would like to thank Bob Barsotti, Bryan Cord, and Ben Wunsch for their work on the Atomic Force Microscope video. They would also like to thank Bryan Cord for creating each video.